Direct Nanoimprint Lithography of Polyethersulfone Using Cellulose‐Based Mold

Fabrication of flexible mold for hybrid nanoimprint-soft lithography

0167-9317/$ see front matter 2011 Elsevier B.V. A doi:10.1016/j.mee.2010.12.107 ⇑ Corresponding author. E-mail address: [email protected] (J We fabricated molds consisting of features in rigid UV-cured resist on an elastic poly(dimethylsiloxane) (PDMS) support for hybrid nanoimprint-soft lithography. The molds were duplicated through coating and curing a UV-curable resist onto a pol...

Polybenzoxazine as a mold-release agent for nanoimprint lithography.

One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine ...

Mold cleaning with polydimethylsiloxane (PDMS) for nanoimprint lithography

We present a simple and effective mold cleaning method for nanoimprint lithography. Polydimethylsiloxane (PDMS) prepolymer is spin-coated onto a contaminated imprint mold, thermally cured in ambient environment, and then peeled off afterwards. Contaminants of 100s m to sub-50 nm sizes are effectively cleaned within one cycle. During the cleaning process, a very thin PDMS film (1~2 nm) is unifo...

Metal hierarchical patterning by direct nanoimprint lithography

Three-dimensional hierarchical patterning of metals is of paramount importance in diverse fields involving photonics, controlling surface wettability and wearable electronics. Conventionally, this type of structuring is tedious and usually involves layer-by-layer lithographic patterning. Here, we describe a simple process of direct nanoimprint lithography using palladium benzylthiolate, a versa...

Enhancement of Fracture Toughnes of Composite/adhesive Interface by In-mold Preparation Using Nanoimprint Lithography